Search results for "Anodic oxide"

showing 10 items of 22 documents

Characterization of the Solid State Properties of Anodic Oxides on Magnetron Sputtered Ta, Nb and Ta-Nb Alloys

2012

Tantalum oxide, niobium oxide and Ta-Nb containing mixed oxides were grown by anodizing sputter-deposited Ta, Nb and Ta-Nb alloys of different compositions. A photoelectrochemical investigation was performed in order to estimate the band gap and the flat band potential of the oxides as a function of their composition. The band gap of the investigated Ta-Nb containing mixed oxides changed monotonically between those estimated for Ta2O5 (4.1 eV) and Nb2O5 (3.4 eV) and in agreement with a proposed correlation between the Band gap of an oxide and the difference of electronegativity of the oxide constituents. From the differential capacitance curves recorded in a wide range of electrode potentia…

431Materials scienceRenewable Energy Sustainability and the EnvironmentSolid-stateCondensed Matter PhysicsSolid State Properties Anodic Oxides Ta-Nb AlloysSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCharacterization (materials science)AnodeSettore ING-IND/23 - Chimica Fisica ApplicataChemical engineeringCavity magnetronMaterials ChemistryElectrochemistry
researchProduct

The Effect of Electronic Properties of Anodized and Hard Anodized Ti and Ti6Al4V on Their Reactivity in Simulated Body Fluid

2022

The electronic properties of barrier and porous layers on Ti and Ti6Al4V were studied. Barrier anodic oxides grown to 40 V on Ti and on Ti6Al4V are both n-type semiconductors with a band gap of 3.3 eV and 3.4 eV respectively, in agreement with the formation of amorphous TiO2. Anodizing to 200 V at 20 mA cm−2 in calcium acetate and β-glycerol phosphate disodium pentahydrate leads to the formation of Ca and P containing porous films with a photoelectrochemical behaviour dependent on the metallic substrate. A band gap of 3.2 eV and the flat band potential of −0.5 V vs Ag/AgCl were measured for the porous oxide on Ti, while optical transitions at 2.15 eV and a significantly more positive flat b…

Aluminum alloyAnodic oxidationPorous layerGlycerol phosphateAnodizingFlat-band potentialBarrier layerOxide surface layerMaterials ChemistryElectrochemistryPentahydrateOxide surface layer Electrochemical Measurments AnodizingTernary alloyN-type semiconductorPorous oxideRenewable Energy Sustainability and the EnvironmentVanadium alloys Anodic oxideSimulated body fluids Electronic propertiesCondensed Matter PhysicsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsEnergy gapSettore ING-IND/23 - Chimica Fisica ApplicataElectrochemical MeasurmentsTitanium dioxideTitanium alloyBody fluidSubstrateCalcium acetate
researchProduct

Characterization of Anodic Oxides on Titanium by Photocurrent and Differential Admittance Techniques

2010

Anodic Oxides on Titanium Photocurrent Spectroscopy Differential Admittance Techniques
researchProduct

Characterization of Anodic Oxides on Magnetron Sputtered Ta-Nb Alloys by Photocurrent Spectroscopy and Differential Admittance Measurements

2010

Anodic Oxides Magnetron Sputtered Ta-Nb Alloys Photocurrent Spectroscopy Differential Admittance Measurements
researchProduct

ELECTROCHEMICAL FABRICATION OF METAL/OXIDE/CONDUCTING POLYMER JUNCTIONS FOR ELECTRONIC DEVICES

2014

Electrochemical fabrication metal/oxide/conducting polymer junctions electronic devicesSettore ING-IND/23 - Chimica Fisica ApplicataSOLID STATE ELECTROLYTIC CAPACITORS FIELD EFFECT TRANSISTORS ANODIC OXIDES CONDUCTING POLYMERS PHOTOELECTROCHEMISTRY ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY PEDOT NIOBIUM OXIDE TITANIUM OXIDE TANTALUM OXIDE
researchProduct

Electrochemically Prepared High-k Thin Films for Resistive Switching Devices

Electrochemical oxidationReRAMSettore ING-IND/23 - Chimica Fisica ApplicataHigh-k materialResistive switchingAnodic oxides; Electrochemical oxidation; High-k materials; Resistive switching; ReRAMAnodic oxide
researchProduct

Growth and field crystallization of anodic films on Ta–Nb alloys

2012

The growth behavior of amorphous anodic films on Ta–Nb solid solution alloys has been investigated over a wide composition range at a constant current density of 50 Am−2 in 0.1 mol dm−3 ammonium pentaborate electrolyte. The anodic films consist of two layers, comprising a thin outer Nb2O5 layer and an inner layer consisting of units of Ta2O5 and Nb2O5. The outer Nb2O5 layer is formed as a consequence of the faster outward migration of Nb5+ ions, compared with Ta5+ ions, during film growth under the high electric field. Their relative migration rates are independent of the alloy composition. The formation ratio, density, and capacitance of the films show a linear relation to the alloy compos…

GDOESSettore ING-IND/23 - Chimica Fisica ApplicataNb–Ta alloyIonic transportTEMTAnodic oxideRBS
researchProduct

Assessment on the use of the amorphous semiconductor theory for the analysis of oxide films

2015

Abstract Although the theory of Schottky barrier in amorphous semiconductors is generally accepted, the limits of validity of such theory have not yet been explored. The classic semi-analytical solution is obtained under the constraint of constant electronic density of states (DOS) distribution in the mobility gap. In order to take into account the presence of a DOS variable in energy, a semi-empirical corrective power law was introduced in this paper. It is shown that the equations derived for thick films maintain their validity also in the case of thin films, provided that the space charge region width remains lower than 70% of the whole film thickness. A new expression based on the use o…

Materials scienceCondensed matter physicsGeneral Chemical EngineeringSchottky barrierOxideanodic oxideElectrolytePower lawAnodechemistry.chemical_compoundelectrochemical impedance spectroscopySettore ING-IND/23 - Chimica Fisica ApplicatachemistryDepletion regionElectrical resistance and conductancedifferential admittanceCondensed Matter::SuperconductivityElectrochemistryChemical Engineering (all)Thin filmSchottky barrieramorphous semiconductor
researchProduct

Anodization and anodic oxides

2018

Anodizing is a low-temperature, low-cost electrochemical process allowing for the growth, on the surface of valve metals and valve metal alloys, of anodic oxides of tunable composition and properties. This article is an overview on theoretical aspects concerning the general aspects of the kinetics of growth of barrier and porous anodic oxides and some of their present and possibly future technological applications of anodic oxides. The first part of the article is devoted to anodic oxide growth models, from Guntherschulze and Betz work (in 1934) to the more recent results on barrier and porous oxide films. The second part is focused on industrial processes to fabricate anodic oxides and the…

Materials scienceNanotechnology02 engineering and technologyDielectricAnodizingElectrochemistryCorrosionAl alloysMicroelectronicsCoatings0502 economics and businessGrowth kineticsValve metals050207 economicsThin filmPorosityHigh-k materialsElectrolytic capacitorBarrier-type oxidesAnodizing05 social sciencesMetallurgy021001 nanoscience & nanotechnologyPorous-type oxidesAnodeCorrosionSettore ING-IND/23 - Chimica Fisica ApplicataAnodic oxidesAlumina membranesDielectrics0210 nano-technologyAluminum
researchProduct

Investigation of the kinetics of growth of anodic oxide films on niobium by galvanostatic and tensiodynamic experiments

1990

Abstract The kinetics of growth of anodic oxide films on niobium has been investigated by interferometric methods. Tensiodynamic experiments allow the growth of the films at constant rate. Photoeffects during the growth of the films under absorbed light give additional information on the growth process.

Materials sciencePassivationAnodizingGeneral Chemical EngineeringInorganic chemistryKineticsNiobiumchemistry.chemical_elementGeneral ChemistryCorrosionConstant ratechemistryGeneral Materials ScienceAnodic oxideCorrosion Science
researchProduct